Nanoscale components have applications in semiconductor manufacturing, medical technology, and photonics. Lithography is one way to produce miniscule structures. However, just like with classical microscopy, the resolution of optical lithography suffers from the diffraction limit. Over the past few decades, near-field and super-resolution techniques have aided modern microscopy to overcome this limit and related solutions were applied in lithography. However, achieving high resolution and high throughput with one single technique has been difficult. Recent lithography advances based upon scanning probe microscopy and arrays of transparent pyramid-shaped elastomeric tips, now allow patterning of molecules over large-areas with high-throughput.